Microwave ECR plasma processing of thin film semiconductors

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dc.contributor.authorChau, The-Tuen_US
dc.date.accessioned2013-02-13T15:55:31Z
dc.date.available2013-02-13T15:55:31Z
dc.date.issued1988en_US
dc.degree.disciplineElectrical Engineeringen_US
dc.degree.levelMaster of Science (M.Sc.)en_US
dc.description.abstracten_US
dc.format.extentviii, 69 leaves :en_US
dc.identifierocm72737140en_US
dc.identifier.urihttp://hdl.handle.net/1993/16668
dc.language.isoengen_US
dc.rightsopen accessen_US
dc.titleMicrowave ECR plasma processing of thin film semiconductorsen_US
dc.typemaster thesisen_US
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