Effects of substrate bias on the properties of a-Si:H films fabricated by ECR microwave plasma CVD

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dc.contributor.authorTse, Thomas Yu-Chauen_US
dc.date.accessioned2013-02-25T16:43:00Z
dc.date.available2013-02-25T16:43:00Z
dc.date.issued1988en_US
dc.degree.disciplineElectrical Engineeringen_US
dc.degree.levelMaster of Science (M.Sc.)en_US
dc.description.abstracten_US
dc.format.extentx, 78 leaves :en_US
dc.identifierocm72731584en_US
dc.identifier.urihttp://hdl.handle.net/1993/16727
dc.language.isoengen_US
dc.rightsopen accessen_US
dc.titleEffects of substrate bias on the properties of a-Si:H films fabricated by ECR microwave plasma CVDen_US
dc.typemaster thesisen_US
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