The effects of deposition parameters on hydrogenated amorphous silicon films fabricated by microwave glow discharge techniques

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dc.contributor.authorMejia Zenteno, Sergio Ruperto Tadeo.en_US
dc.date.accessioned2014-11-24T15:21:59Z
dc.date.available2014-11-24T15:21:59Z
dc.date.issued1984en_US
dc.degree.disciplineElectrical Engineeringen_US
dc.degree.levelMaster of Science (M.Sc.)en_US
dc.description.abstracten_US
dc.format.extentviii, 127 leaves :en_US
dc.identifier99135063490001651en_US
dc.identifier.urihttp://hdl.handle.net/1993/28702
dc.language.isoengen_US
dc.rightsopen accessen_US
dc.titleThe effects of deposition parameters on hydrogenated amorphous silicon films fabricated by microwave glow discharge techniquesen_US
dc.typemaster thesisen_US
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