EC microwave plasma processing techniques and effects of deposition parameters on properties of MOS systems

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dc.contributor.authorChau, The-Tuen_US
dc.date.accessioned2013-04-12T20:39:18Z
dc.date.available2013-04-12T20:39:18Z
dc.date.issued1995en_US
dc.degree.disciplineElectrical and Computer Engineeringen_US
dc.degree.levelDoctor of Philosophy (Ph.D.)en_US
dc.description.abstracten_US
dc.format.extentxv, 155 leaves :en_US
dc.identifier(Sirsi) AIF-7573en_US
dc.identifier.urihttp://hdl.handle.net/1993/18772
dc.language.isoengen_US
dc.rightsopen accessen_US
dc.titleEC microwave plasma processing techniques and effects of deposition parameters on properties of MOS systemsen_US
dc.typedoctoral thesisen_US
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