EC microwave plasma processing techniques and effects of deposition parameters on properties of MOS systems
| dc.contributor.author | Chau, The-Tu | en_US |
| dc.date.accessioned | 2013-04-12T20:39:18Z | |
| dc.date.available | 2013-04-12T20:39:18Z | |
| dc.date.issued | 1995 | en_US |
| dc.degree.discipline | Electrical and Computer Engineering | en_US |
| dc.degree.level | Doctor of Philosophy (Ph.D.) | en_US |
| dc.description.abstract | en_US | |
| dc.format.extent | xv, 155 leaves : | en_US |
| dc.identifier | (Sirsi) AIF-7573 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1993/18772 | |
| dc.language.iso | eng | en_US |
| dc.title | EC microwave plasma processing techniques and effects of deposition parameters on properties of MOS systems | en_US |
| dc.type | doctoral thesis | en_US |
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