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Faculty of Graduate Studies (Electronic Theses and Practica)
FGS - Electronic Theses and Practica
EC microwave plasma processing techniques and effects of deposition parameters on properties of MOS systems
EC microwave plasma processing techniques and effects of deposition parameters on properties of MOS systems
Files
Chau_EC_microwave.pdf
(8.43 MB)
Date
1995
Authors
Chau, The-Tu
Journal Title
Journal ISSN
Volume Title
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Abstract
Description
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Citation
URI
http://hdl.handle.net/1993/18772
Collections
FGS - Electronic Theses and Practica
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