Show simple item record

dc.contributor.author Sun, Yitao en_US
dc.date.accessioned 2007-07-12T17:48:57Z
dc.date.available 2007-07-12T17:48:57Z
dc.date.issued 2001-07-01T00:00:00Z en_US
dc.identifier.uri http://hdl.handle.net/1993/2557
dc.description.abstract Integrated demultiplexers and other DWDM components can be fabricated from optical waveguides. In particular, DWDM demultiplexers can be fabricated from silicon oxynitride optical waveguides. Optical attenuation and polarization-dependent propagation are two properties of the optical waveguides that affect the performance of the integrated component. In this thesis, we studied how an externally applied stress can be used to reduce the polarization dependence in silicon oxynitride optical waveguides. We introduce external stress (strain) into optical waveguides of our devices by bending the underlying substrate. Either c mpressive or tensile stress can be introduced in a direction that is either parallel or perpendicular to the direction of optical propagation. An integrated optical demultiplexer is an ideal device for the measurement for birefringence. We used an integrated optical demultiplexer and a tunable laser to measure the stress-induced change of the effective index in our optical waveguides. We have demonstrated that the application of stress can be used to decrease the birefringence by 30% or to increase it by 90%. (Abstract shortened by UMI.) en_US
dc.format.extent 2896212 bytes
dc.format.extent 184 bytes
dc.format.mimetype application/pdf
dc.format.mimetype text/plain
dc.language en en_US
dc.language.iso en_US
dc.title Effect of stress on silicon oxynitride optical waveguides and devices en_US
dc.degree.discipline Physics & Astronomy en_US
dc.degree.level Master of Science (M.Sc.) en_US


Files in this item

This item appears in the following Collection(s)

Show simple item record

View Statistics