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dc.contributor.author Lam, Baldwin Pok Man en_US
dc.date.accessioned 2013-04-12T21:09:33Z
dc.date.available 2013-04-12T21:09:33Z
dc.date.issued 1995 en_US
dc.identifier (Sirsi) AIE-4297 en_US
dc.identifier.uri http://hdl.handle.net/1993/18831
dc.description.abstract en_US
dc.format.extent x, 69 leaves : en_US
dc.language en_US
dc.rights en_US
dc.title Properties of fluorine-incorporated silicon oxide films and effects of photon radiation during PECVD en_US
dc.degree.discipline Electrical and Computer Engineering en_US


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