Show simple item record Li, Yong Qiang en_US 2013-03-04T20:51:16Z 2013-03-04T20:51:16Z 1989 en_US
dc.identifier ocm72753217 en_US
dc.description.abstract en_US
dc.format.extent iii [i.e. xiv], 92 leaves : en_US
dc.language en en_US
dc.rights en_US
dc.title Investigation of the properties of plasma enhanced CVD silicon dioxide and its applications to VLSI technology en_US Electrical Engineering en_US

Files in this item

This item appears in the following Collection(s)

Show simple item record

View Statistics